Department of Materials Physics

Thin Film Engineering Section

TEL:+81-727-51-9532
FAX:+81-727-51-9631
E-mail:hakumaku@onri.go.jp

Last update: December 10, 1997

Scope of Section

In the Thin Film Engineering Section, the research staff are researching on advanced thin film materials and new film growing techniques, among others. Fields of the research there also cover new film growth adopting precision control of process parameters, the epitaxy process and low-temperature film growth making use of the photo-excitation, and porous film growth techniques, etc. Making use of these techniques, research efforts are being made to develop ferroelectric thin films with electro-optic characteristics, optical multi-layered films such as zone plates for X-ray optical applications, and porous films that can be applied to display devices, along with research on viable film evaluation techniques.

Research Projects

Advanced Coating Technolgy for Functional Thin Films
(Designated R&D)[FY1994-FY1998]
Research and development of ultra-high-quality transparent conductive films fabrication
(Designated R&D)[FY1997-FY1999]
Preparation of low-cost cathode materials for alkaline ion battery in mild temperature condition
(Special Research) [FY1997-FY2000]
Study on the preparative technology of Li-ion conductive thin film oxides
(Ordinary Research) [FY1997-FY1999]
Study of fabrication and application of multilayer Fresnel zone plate for hard x-ray
(Special Coordination Funds for Promoting Science and Technology)[FY1996-1997]

Staffs of Section

name	research field	E-mail address
Dr.Tadashi ISHIDA (Head of Section)	Photo-CVD Preparation of Transparent Condutive Films by DC Sputtering	ishida@onri.go.jp
Dr.Shigeharu TAMURA	Fabrication process of multilayer lens for x-ray Thin films fabrication by photo-excited CVD process hin films fabrication by multi-beam-excited PVD process	tamura@onri.go.jp
Mr.Shoichi MOCHIZUKI	Ferroelectric Thin Films	mochi@onri.go.jp
Mr.Toshiyuki MIHARA	Ferroelectric Thin Films Preparation of Thin Films by Laser	mihara@onri.go.jp
Dr.Hironori KOBAYASHI	Synthesis of new Li-ion conductive oxides Preparative technology of Li-ion conductive thin film oxides	kobaba@onri.go.jp

Recent publication of research

papers published on magazines
- N.Kamijo, Y.Suzuki, S.Tamura, K.Handa, A.Takeuchi, S.Yamamoto, M.Ando, K.Ohsumi and H.Kihara
  "Fabrication of Hard X-ray Sputtered-Sliced Fresnel Phase Zone Plate"
  [Review of Scientific Instruments, vol.68, p.14 1997]
- S.Tamura, K.Mori, T.Maruhashi, K.Yoshida, K.Ohtani, N.Kamijo, Y.Suzuki and H.Kihara
  "Multilayer Fresnel Zone Plate for 8 KeV X-ray by DC Sputtering Deposition"
  [Mater. Res. Soc. Proc., vol.441, p.779 1997]
- S. Tamura, K. Ohtani, N. Kamijo, Y.Suzuki and H.Kihara
  "Influence of Deposotion Parameters on Layer Structure of Ag/C Multilayer Zone Plate for use in Hard X-ray Region"
  [Thin Solid Films, vol.281/282, p.243-245 1996]
- S. Mochizuki, T. Mihara and T.Ishida
  "High-Deposition-Rate Growth of PZT Thin Films by Reactive Electron Beam Coevaporation Using Ti/Zr Alloy"
  [Integrated Ferroelectrics, Vol. 12, p. 125, 1996]
- S. Mochizuki, T. Mihara and T.Ishida
  "Preparation of PbTiO3 Films on Conductive Oxide by Reactive Electron Beam Coevaporation"
  [Ferroelectrics, Vol. 186, p. 37, 1996]
- T. Mihara, S. Mochizuki and R. Makabe
  "c-Axis Oriented PbTiO3 Thin Films on MgO and Their Microstructure"
  [Jpn. J. Appl. Phys. Vol. 35 (1996) 4905]
- T. Mihara, S. Mochizuki and R. Makabe
  "c-axis-oriented PbTiO3 thin films prepared by sputter-assisted plasma CVD"
  [Thin Solid Films 281-282 (1996) 457]
- S.Mochizuki, T.Mihara, and T.Ishida
  "High-Deposition-Rate Growth of Lead Titanate Zirconate Films by Reactive Electron Beam Coevaporation"
  [Japanese Journal of Applied Physics, Vol. 33, p. 5291, 1994]
- T.Ishida, O.Tabata, J.il Park, S.Ho Shin, H.Magara, S.Tamura, S.Mochizuki and T.Mihara
  "Highly conductive transparent F-doped tin oxide films were prepared by photo-CVD and thermal-CVD"
  [Thin Solid Films 281-282 , p. 228(1996)]
- H. Kobayashi, R. Kanno, Y. Kawamoto, M. Tabuchi, and O. Nakamura
  "Physical properties of the de-lithiated Li2-xRuO3 with the layered structure"
  [Solid State Ionics, 86-88, 859 (1996)]
- H. Kobayashi, R. Kanno, M. Tabuchi, H. Kageyama, O. Nakamura and M. Takano
  "Structure and Charge-discharge Characteristics of New Layered Oxides Li1.8Ru0.6Fe0.6O3 and Li2IrO3"
  [J. Power Sources, submitted.]
patents
- Patent No.2099141 "Photo-CVD Preparation Apparatus for Thin Films "
  T.Ishida, S.Kimura, S.Mochizuki, S.Tamura and T.Mihara
  (October 22 ,1996)

Others

Please send questions / comments to hakumaku@onri.go.jp .

by M.Taniguchi, Osaka Natl. Res. Inst.